| Why | Category | Data centers & chips |
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| Level | Hard |
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| Use | Gas molecule that lays down one atomic layer at a time, with fewer impurities |
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| What | Atoms | Molecule 10–40 + surface 100–300. Al Hf Ti Ru C H N O |
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| Build | Testing | Hard ALD tool time with a partner |
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| Funding | Compute ~$500–1k · Make ~$20–50k · Test ~$30–100k tool time · Other ~$20k patents |
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| Time | Make 3–6 months · Test 3–6 months of tool time · Total ~6–12 months |
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| How | Contact us for the design specs and build plan → |
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| Demo | Precursor lands, reacts, leaves a clean layer, pulse by pulse |
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| Competition | In-house R&D at suppliers |
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| Business | Buyers | Merck (EMD), Air Liquide, Entegris; users TSMC, Intel, Samsung |
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| Revenue | High Co-development ~$0.5–2M, royalty on chemical sales. ~$1–5M/yr |
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